Currently using ASML’s lithography machines 200 plates per second production is possible, in the future 400 to 500 plates The aim is to reduce costs by increasing the production figure. Van den Brink also emphasized that a modular and unifying design will be preferred for the company’s future family of EUV vehicles.
Patterns with 8nm density could be printed
Van der Brink said that as a result of the adjustments made to the company’s new High-NA tools, the device 8nm He announced that they broke the density record by printing patterns with high density. Two months ago the company 10nm He managed to reach density. For comparison, ASML’s standard Low-NA EUV machines 13,5nm’It can print critical sizes (CD, the smallest feature that can be printed).
This milestone is the result of ASML’s more than 10 years of R&D and billions of euros of investment. However, optimizing the system and using the technology There is still a lot of work to be done to prepare it for mass production. While the company continues to work on the device in the Netherlands, Intel is the only chipmaker to assemble the High-NA system. It closely follows in ASML’s footsteps at the D1X factory in Oregon. Intel will use the EXE:5200 High-NA machine for R&D purposes in the first place, then node 14A will put it into production for.
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