Samsung will prioritize the new vehicle research and development will use it for its purposes. The company is also working on a High-NA ecosystem with Lasertec, JSR, Tokyo Electron and Synopsys.
Samsung’s first ASML Twinscan EXE:5000 High-NA lithography system will enable the company to develop next-generation manufacturing technologies for logic and DRAM fabrication. It will be installed on the Hwaseong campus. of the unit It is expected to become operational in mid-2025. As a result, Samsung will have its first High-NA EUV vehicle operational about a year after Intel, but its rivals TSMC and SK will be ahead of hynix. It is not yet clear when Samsung will adopt High-NA EUV for mass production.
High-NA will establish an EUV ecosystem
Samsung around High-NA EUV technology an advanced ecosystem plans to establish. In addition to acquiring the new equipment, the South Korean giant is collaborating with the Japanese company Lasertec to develop inspection equipment specifically for High-NA photomasks. In this context, Samsung has reportedly purchased Actis A300, Lasertec’s High-NA EUV mask inspection tool. Samsung is also collaborating with photoresist manufacturer JSR and etching machines manufacturer Tokyo Electron to prepare for commercial application of High-NA EUV tools by 2027.
ASML’s High-NA EUV Twinscan EXE tool provides maximum 13 nm available that allows resolution Low-NA EUV significantly higher than the systems 8 nm can reach resolution. With this development, Transistors will become approximately 1.7 times smaller, transistor density will almost triple.
Although low-NA systems can also achieve this level of resolution and density, they are costly and complex. double patterning They require the process. With the transition to High-NA EUV technology, the need for double patterning is eliminated. It is expected that production will be simplified and efficiency and costs will decrease.
Reaching these 8nm critical dimensions is of great importance for producing chips with sub-3nm production technologies. Still, on 2nm class nodes, almost all chip manufacturers will use dual patterning. Intel is also adopting pattern shaping tools for the 20A node. Intel first introduced High-NA EUV 14A plans to use it in the process.
Source
https://www.tomshardware.com/tech-industry/samsung-may-start-installing-its-first-high-na-euv-litho-tool-in-late-2024
https://www.sedaily.com/NewsView/2DD033QDVI
This news our mobile application Download using
You can read it whenever you want (even offline):
Source link: https://www.donanimhaber.com/samsung-asml-nin-high-na-euv-cihazini-bu-sene-sonunda-kuracak–180764